Sapphire Substrate – C-Plane

Basal Plane Sapphire Substrates with one or both surfaces polished are useful for the growth of lll-V and ll-Vl compoounds, such as GaN, for bright blue and green LED and laser diodes. Other applications include mercury cadmium telluride for infrared detector applications.

Standard Specification
Material Czochralski grown sapphire (>=99.995% High Purity monocrystalline Al2O3).
Surface Orientation C-Plane (0001) surface orientation, also called 0-degrees, off M (1-100) 0.2&deg, 0.3&deg . Other offcuts available.
Crystallinity No visual evidence of slips, twins, lineage or fractures
Dimensions Outer Diameter 50.8mm ± 0.1mm, 76.2mm ± 0.25mm, 100.0mm ± 0.4mm
150.0mm ± 0.5mm
Thickness 500μm ± 10μm, 430μm ± 10μm, 330μm ± 15μm
Surface Flatness <25μm, depending on thickness
Surface Bow <25μm, depending on thickness
Surface Taper <25μm, depending on thickness
Primary Flat Length 16mm ± 1mm, 22mm ± 1mm, 32.5mm ± 1mm
Primary Flat Location Parallel to M-axis, within 0.2 °
Edges The edges of the substrates have a ground finish.
Edge Chips Edge defects in general will not exceed those stated in SEMI M3-91.
Frontside Surface Finish A smooth, polished surface finish suitable for epitaxy. No visible scratches, pits, dimples or contamination allowed. Ra typically < 0.20nm.
Backside Surface Finish Depends on whether wafer is single side polished or double side polished. SSP: Fine ground, Ra typically 0.4 to 1.5μm. DSP: Polished.
Note Other wafers orientations are available, including R-plane (1 -1 0 2), A-plane (1 1 -2 0) and M-plane (1 -1 0 0).

The data above is representative only, with a combination of data from our suppliers, and should not be considered absolute or warrantable. Specifications will be in given in our quotations and additional information is available on request. For a quotation please do not hesitate to contact us with your specific requirements.

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